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Electron beam lithography
Electron beam lithography (EBL) is used to fabricate nanoscale devices by patterning through the exposure of an electron beam sensitive resist. The University of Manchester has many years of experience and is extremely competent in the use of EBL. This knowledge has now been passed on to the National Graphene Institute where we have several EBL systems, most of which consist of a pattern generator attachment to a scanning electron microscope (SEM).