Wet chemistry

In our cleanrooms, many aspects of graphene and 2D materials research are made possible by processes borrowed from thin-film or semiconductor processing. Many of these processes are well established having been developed and fine-tuned over many decades of research and industrial activities. Others need to be adapted to the specific requirements of 2D materials research. In particular, the term "wet chemistry" encompasses a large variety of processes based on liquid chemicals commonly used in semiconductor processing: from substrate cleaning and preparation to etching structures and dissolving resists for metal lift-off. These processes are performed at a controlled temperature in either purpose-built fume hoods or wet benches using high purity solvents, acids and alkalis.